Recycling losses and tapered lineic microcavities on SOI

P. Velha (1) , J. Rodier , Philippe Lalanne (2) , D. Peyrade (1) , E. Picard (3) , T. Charvolin (4) , E. Hadji (3)

1 LTM - Laboratoire des technologies de la microélectronique
2 Laboratoire Charles Fabry de l'Institut d'Optique / Naphel
3 SiNaps - Silicon Nanoelectronics Photonics and Structures
4 INAC - Institut Nanosciences et Cryogénie

Short microcavities consisting of two identical tapered hole mirrors etched into silicon-on-insulator ridge waveguides are investigated. They are designed for operating at telecom wavelength. We describe theoretically and experimentally two different ways to boost quality factors to some thousands. In one hand, we investigate the adaptation of mode profile to suppress mismatch losses. In an other hand, we explore the recycling of the losses. We obtained quality factor up to 3000, which opens the route to WDM applications.

Domaines: Sciences de l'ingénieur [physics]

P. Velha, J. Rodier, Philippe Lalanne, D. Peyrade, E. Picard, et al.. Recycling losses and tapered lineic microcavities on SOI. Proceedings of SPIE, the International Society for Optical Engineering, 2006, 6195, pp.61951S. ⟨10.1117/12.664506⟩. ⟨hal-00463068⟩